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Verlag GmbH log-normal distribution function
Log Normal Distribution Function, supplied by Verlag GmbH, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/log-normal+distribution+function/log+normal+distribution+function/10__1002_slash_pssa__200521268-73-45-29
Average 90 stars, based on 1 article reviews
log-normal distribution function - by Bioz Stars, 2026-09
90/100 stars

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Article Title: Nanoparticle morphology in FeCo-Al2O3granular films with tunneling giant magnetoresistance
Article Snippet: A series of FeCo–Al 2 O 3 granular films were prepared by a magnetron-controlled sputtering system.. The tunneling giant magnetoresistance and nanoparticle morphology of FeCo particles in FeCo–Al 2 O 3 granular films were directly determined utilizing a conventional four-probe method and TEM (HRTEM) observation, respectively.. The results indicated that the tunneling giant magnetoresistance can reach a maximum of 6.9% at about 32.8 vol% FeCo particles, so far the highest value reported at room temperature and under an applied field of 12.5 kOe.



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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
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Verlag GmbH log-normal distribution function
The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting <t> lognormal </t> dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.
Log Normal Distribution Function, supplied by Verlag GmbH, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/log-normal+distribution+function/log+normal+distribution+function/10__1002_slash_pssa__200521268-73-45-29
Average 90 stars, based on 1 article reviews
log-normal distribution function - by Bioz Stars, 2026-09
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The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting  lognormal  dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.

Journal: Chempluschem

Article Title: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two‐Dimensional Perovskite Nanosheets: An AFM Study

doi: 10.1002/cplu.202400678

Figure Lengend Snippet: The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting lognormal dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.

Article Snippet: The most probable adhesion force values were determined for each condition by applying a log‐normal probability distribution function to the histograms (SigmaPlot, Systat Software Inc.).

Techniques: