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    Structured Review

    Rigaku Corporation x ray diffraction xrd analysis
    Structural, chemical, and electronic modulation in MoS 2 films induced by vdW‐gap molecular confinement. (a) Schematic of the molecule‐confined MoS 2 structure, illustrating the insertion of molecules within the vdW gap. <t>(b)</t> <t>X‐ray</t> <t>diffraction</t> patterns of H 2 O‐MoS 2 and EtOH‐MoS 2 films under different annealing temperatures (RT, 200°C, and 300°C), showing the molecule‐dependent evolution of interlayer spacing. (c) Temperature‐dependent phase transition of EtOH‐MoS 2 from 1T to 2H, identified by Mo 3d XPS spectra. (d) C 1s XPS spectra revealing the presence and chemical state of confined molecules. (e) Surface potential variation measured by KPFM as a function of annealing temperature, showing thermally activated electronic modulation. (f) Work function changes of H 2 O‐ and EtOH‐ MoS 2 films after annealing at 200°C, demonstrating an upward Fermi‐level shift and the associated electron doping effect.
    X Ray Diffraction Xrd Analysis, supplied by Rigaku Corporation, used in various techniques. Bioz Stars score: 99/100, based on 44094 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/x+ray+diffraction/SmartLab/pmc13650019-228-10-20
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    1) Product Images from "Van der Waals Gap‐Confined Molecular Engineering of MoS 2 for Selectivity‐Enhanced and Humidity‐Tolerant Gas Sensing"

    Article Title: Van der Waals Gap‐Confined Molecular Engineering of MoS 2 for Selectivity‐Enhanced and Humidity‐Tolerant Gas Sensing

    Journal: Advanced Science

    doi: 10.1002/advs.78072

    Structural, chemical, and electronic modulation in MoS 2 films induced by vdW‐gap molecular confinement. (a) Schematic of the molecule‐confined MoS 2 structure, illustrating the insertion of molecules within the vdW gap. (b) X‐ray diffraction patterns of H 2 O‐MoS 2 and EtOH‐MoS 2 films under different annealing temperatures (RT, 200°C, and 300°C), showing the molecule‐dependent evolution of interlayer spacing. (c) Temperature‐dependent phase transition of EtOH‐MoS 2 from 1T to 2H, identified by Mo 3d XPS spectra. (d) C 1s XPS spectra revealing the presence and chemical state of confined molecules. (e) Surface potential variation measured by KPFM as a function of annealing temperature, showing thermally activated electronic modulation. (f) Work function changes of H 2 O‐ and EtOH‐ MoS 2 films after annealing at 200°C, demonstrating an upward Fermi‐level shift and the associated electron doping effect.
    Figure Legend Snippet: Structural, chemical, and electronic modulation in MoS 2 films induced by vdW‐gap molecular confinement. (a) Schematic of the molecule‐confined MoS 2 structure, illustrating the insertion of molecules within the vdW gap. (b) X‐ray diffraction patterns of H 2 O‐MoS 2 and EtOH‐MoS 2 films under different annealing temperatures (RT, 200°C, and 300°C), showing the molecule‐dependent evolution of interlayer spacing. (c) Temperature‐dependent phase transition of EtOH‐MoS 2 from 1T to 2H, identified by Mo 3d XPS spectra. (d) C 1s XPS spectra revealing the presence and chemical state of confined molecules. (e) Surface potential variation measured by KPFM as a function of annealing temperature, showing thermally activated electronic modulation. (f) Work function changes of H 2 O‐ and EtOH‐ MoS 2 films after annealing at 200°C, demonstrating an upward Fermi‐level shift and the associated electron doping effect.

    Techniques Used: Sublimation

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    Analysis:

    Article Title: Van der Waals Gap‐Confined Molecular Engineering of MoS 2 for Selectivity‐Enhanced and Humidity‐Tolerant Gas Sensing
    Article Snippet: .. To examine changes in the interlayer spacing and crystallographic structure, x‐ray diffraction (XRD) analysis was conducted using a SmartLab diffractometer (Rigaku) with Cu Kα radiation (λ = 0.15412 nm). .. The interlayer spacing was calculated using Bragg's law ( n λ = 2d sin(θ) ), where d is the spacing between adjacent layers, λ is the x‐ray wavelength, and θ is the diffraction angle.

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    Image Search Results


    Structural, chemical, and electronic modulation in MoS 2 films induced by vdW‐gap molecular confinement. (a) Schematic of the molecule‐confined MoS 2 structure, illustrating the insertion of molecules within the vdW gap. (b) X‐ray diffraction patterns of H 2 O‐MoS 2 and EtOH‐MoS 2 films under different annealing temperatures (RT, 200°C, and 300°C), showing the molecule‐dependent evolution of interlayer spacing. (c) Temperature‐dependent phase transition of EtOH‐MoS 2 from 1T to 2H, identified by Mo 3d XPS spectra. (d) C 1s XPS spectra revealing the presence and chemical state of confined molecules. (e) Surface potential variation measured by KPFM as a function of annealing temperature, showing thermally activated electronic modulation. (f) Work function changes of H 2 O‐ and EtOH‐ MoS 2 films after annealing at 200°C, demonstrating an upward Fermi‐level shift and the associated electron doping effect.

    Journal: Advanced Science

    Article Title: Van der Waals Gap‐Confined Molecular Engineering of MoS 2 for Selectivity‐Enhanced and Humidity‐Tolerant Gas Sensing

    doi: 10.1002/advs.78072

    Figure Lengend Snippet: Structural, chemical, and electronic modulation in MoS 2 films induced by vdW‐gap molecular confinement. (a) Schematic of the molecule‐confined MoS 2 structure, illustrating the insertion of molecules within the vdW gap. (b) X‐ray diffraction patterns of H 2 O‐MoS 2 and EtOH‐MoS 2 films under different annealing temperatures (RT, 200°C, and 300°C), showing the molecule‐dependent evolution of interlayer spacing. (c) Temperature‐dependent phase transition of EtOH‐MoS 2 from 1T to 2H, identified by Mo 3d XPS spectra. (d) C 1s XPS spectra revealing the presence and chemical state of confined molecules. (e) Surface potential variation measured by KPFM as a function of annealing temperature, showing thermally activated electronic modulation. (f) Work function changes of H 2 O‐ and EtOH‐ MoS 2 films after annealing at 200°C, demonstrating an upward Fermi‐level shift and the associated electron doping effect.

    Article Snippet: To examine changes in the interlayer spacing and crystallographic structure, x‐ray diffraction (XRD) analysis was conducted using a SmartLab diffractometer (Rigaku) with Cu Kα radiation (λ = 0.15412 nm).

    Techniques: Sublimation

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    Figure Lengend Snippet: Physicochemical and mechanical characterization of the hydrogel formulations. A) Schematic illustration of the preparation of GA–Zn 2+ /BP@SilMA and incorporation of osteogenic bone microtissues (BO). B) Photographs of the hydrogel precursor before and after ultraviolet. C) Scanning electron microscopy (SEM) images of SilMA, GA–Zn 2+ @SilMA, GA–Zn 2+ /BP@SilMA, and GA–Zn 2+ /BP/BO@SilMA hydrogels. D) Energy-dispersive X-ray spectroscopy (EDS) elemental maps of C, O, P, and Zn in the composite hydrogel. E) Fourier-transform infrared spectroscopy (FTIR) spectra of the different hydrogel formulations. F) X-ray diffraction (XRD) patterns of the different hydrogel formulations. G) Atomic force microscopy (AFM) force–separation curves. H) Zn 2+ release profile. I) Degradation behavior of the hydrogel. J) Young's modulus of the different hydrogel formulations. Data are presented as mean ± SD. *p < 0.05 and ****p < 0.0001.

    Article Snippet: Energy-dispersive X-ray spectroscopy (EDS, Sigma 360, ZEISS, Germany) mapping was used to examine the distribution of C, O, Zn, and P.Fourier transform infrared spectroscopy(FTIR, Nicolet iS50, Thermo Fisher Scientific, USA) was performed with 32 scans in the range of 4000–400 cm −1 at a resolution of 4 cm −1 ; X-ray diffraction patterns (XRD, SmartLab SE, Rigaku Corporation, Japan) were recorded from 5° to 90°.

    Techniques: Scanning Electron Microscopy, Energy Dispersive X-Ray, Spectroscopy, Fourier Transform Infrared Spectroscopy, Microscopy