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Heidelberg Instruments Inc laser pattern generator μpg 101
Laser Pattern Generator μpg 101, supplied by Heidelberg Instruments Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/laser+pattern+generators/laser+pattern+generator+%CE%BCpg+101/pmc09020879-79-47-52
Average 90 stars, based on 1 article reviews
laser pattern generator μpg 101 - by Bioz Stars, 2026-10
90/100 stars

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Article Title: Screen-printed digital microfluidics combined with surface acoustic wave nebulization for hydrogen-deuterium exchange measurements.
Article Snippet: The SAWN configuration was first designed in AutoCAD before being written into a chrome mask by a Heidelberg μPG 101 Laser Pattern Generator (Heidelberg Instruments Mikrotechnik GmbH Tullastrasse 2, D-69126 Heidelberg, Germany) at the University of Washington Nanotech User Facility (https://depts.washington.edu/ntuf/).

Article Title: Flexible thin film pH sensor based on low‐temperature atomic layer deposition
Article Snippet: Flexible and transparent zinc oxide (ZnO) thin film fieldeffect transistors (TF-FET) for the use as small volume potentiometric pH sensors are developed.. Low temperature atomic layer deposition (ALD) is used for the fabrication of the metal oxides ZnO and aluminum dioxide (Al2O3).. Changing the deposition temperature of the ZnO from 150 to 100 8C allowed a significant increase in resistivity by four orders of magnitude.

Article Title: Flexible Antennas: A Review
Article Snippet: A practical 5.8 GHz antenna for the wireless operation was fabricated on a flexible glass by photolithography using Shipley S1813 photoresist and a Heidelberg Instruments μPG 101 pattern generator.

Clinical Proteomics:

Article Title: Variance in Landscape Connectivity Shifts Microbial Population Scaling
Article Snippet: .. Devices were fabricated using soft lithography techniques (Qin et al., ): A silicon wafer was coated with a thin film (5 μm, height of the device) of the negative photoresist SU-8 (SU-8 2005, MicroChem) and the design of the device was written into the resist with a laser pattern generator (μPG 101, Heidelberg Instruments) to fabricate a master mold on which Polydimethylsiloxane (10:1 PDMS:curing agent, Sylgard 184, Dow Corning) was deposited to yield an elastomeric stamp that was covalently bonded to a glass cover slip by oxygen plasma activation (29.6 W, 400 mTorr, 45 s; PDC-002, Harrick Plasma) of both the PDMS and glass parts. ..

Article Title: Ecological succession and the competition-colonization trade-off in microbial communities.
Article Snippet: .. Devices were fabricated using soft lithography techniques [29]: a silicon wafer was coated with a thin film (5μ m, height of the device) of the negative photoresist SU-8 (SU-8 2005, MicroChem), and the design of the device was written into the resist with a laser pattern generator ( μ PG 101, Heidelberg Instruments) to fabricate a master mold on which polydimethylsiloxane, PDMS (10:1 PDMS:curing agent; Sylgard 184, Dow Corning), was deposited to yield an elastomeric stamp that was covalently bonded to a glass cover slip by oxygen plasma activation (29.6 W, 400mTorr, 45 sec; PDC-002, Harrick Plasma) of both the PDMS and glass parts. ..

Article Title: Variance in Landscape Connectivity Shifts Microbial Population Scaling.
Article Snippet: .. Devices were fabricated using soft lithography techniques (Qin et al., 2010): A silicon wafer was coated with a thin film (5 μm, height of the device) of the negative photoresist SU8 (SU-8 2005, MicroChem) and the design of the device was written into the resist with a laser pattern generator (μPG 101, Heidelberg Instruments) to fabricate a master mold on which Polydimethylsiloxane (10:1 PDMS:curing agent, Sylgard 184, Dow Corning) was deposited to yield an elastomeric stamp that was covalently bonded to a glass cover slip by oxygen plasma activation (29.6 W, 400 mTorr, 45 s; PDC-002, Harrick Plasma) of both the PDMS and glass parts. ..

Activation Assay:

Article Title: Variance in Landscape Connectivity Shifts Microbial Population Scaling
Article Snippet: .. Devices were fabricated using soft lithography techniques (Qin et al., ): A silicon wafer was coated with a thin film (5 μm, height of the device) of the negative photoresist SU-8 (SU-8 2005, MicroChem) and the design of the device was written into the resist with a laser pattern generator (μPG 101, Heidelberg Instruments) to fabricate a master mold on which Polydimethylsiloxane (10:1 PDMS:curing agent, Sylgard 184, Dow Corning) was deposited to yield an elastomeric stamp that was covalently bonded to a glass cover slip by oxygen plasma activation (29.6 W, 400 mTorr, 45 s; PDC-002, Harrick Plasma) of both the PDMS and glass parts. ..

Article Title: Ecological succession and the competition-colonization trade-off in microbial communities.
Article Snippet: .. Devices were fabricated using soft lithography techniques [29]: a silicon wafer was coated with a thin film (5μ m, height of the device) of the negative photoresist SU-8 (SU-8 2005, MicroChem), and the design of the device was written into the resist with a laser pattern generator ( μ PG 101, Heidelberg Instruments) to fabricate a master mold on which polydimethylsiloxane, PDMS (10:1 PDMS:curing agent; Sylgard 184, Dow Corning), was deposited to yield an elastomeric stamp that was covalently bonded to a glass cover slip by oxygen plasma activation (29.6 W, 400mTorr, 45 sec; PDC-002, Harrick Plasma) of both the PDMS and glass parts. ..

Article Title: Variance in Landscape Connectivity Shifts Microbial Population Scaling.
Article Snippet: .. Devices were fabricated using soft lithography techniques (Qin et al., 2010): A silicon wafer was coated with a thin film (5 μm, height of the device) of the negative photoresist SU8 (SU-8 2005, MicroChem) and the design of the device was written into the resist with a laser pattern generator (μPG 101, Heidelberg Instruments) to fabricate a master mold on which Polydimethylsiloxane (10:1 PDMS:curing agent, Sylgard 184, Dow Corning) was deposited to yield an elastomeric stamp that was covalently bonded to a glass cover slip by oxygen plasma activation (29.6 W, 400 mTorr, 45 s; PDC-002, Harrick Plasma) of both the PDMS and glass parts. ..

MicroChIP Assay:

Article Title: Ultrasensitive melanoma biomarker detection using a microchip SERS immunoassay with anisotropic Au–Ag alloy nanoboxes
Article Snippet: .. Microchip biosensor was fabricated according to previous literature.22 The fabrication and device design are shown in ESI Fig. S2 and S3.† Briey, the electrodes layout and a second sodalimemask that carried the pattern was designed using Layout LEdit V15 (Tanner Research, Monrovia, USA) and written to a 5 5-inch soda lime chrome mask (Shenzhen Qingyi Precision Mask Making, Shenzhen, Singapore) using a direct laser writer mPG 101 (Heidelberg Instruments, Heidelberg, Austria) with 5- micron head attached. ..



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