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Heidelberg Instruments Inc laser-based maskless pattern generator μpg101
Laser Based Maskless Pattern Generator μpg101, supplied by Heidelberg Instruments Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/laser+pattern+generators/laser+lithography+system+heidelberg+instruments+%C2%B5pg+101/pm36763988-45-8-13
Average 90 stars, based on 1 article reviews
laser-based maskless pattern generator μpg101 - by Bioz Stars, 2026-10
90/100 stars

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Article Title: Kinetics of N- to M-Polar Switching in Ferroelectric Al 1-x Sc x N Capacitors.
Article Snippet: A lithographic step (Heidelberg Instruments μPG 101 laser lithography tool), followed by deposition of 5 nm Ti and 50 nm platinum (Pt) by Adv.

Article Title: Impact of the Electric Polarizability on the Transport and Collective Dynamics of Metallodielectric Janus Particles.
Article Snippet: The objective of this article is to investigate how the electric polarizability manifests on the propulsion and collective dynamics of metallodielectric Janus particles by comparing the velocity spectra under rotating and nonrotating AC fields.. Janus particles were fabricated by depositing sequential layers of titanium and SiO2 on spherical cores.. Model systems of known polarizability were created by varying the thickness of titanium or by adjusting the concentration of electrolyte.

Article Title: CONNECTED DROPLET SHAPE ANALYSIS FOR NANOFLOW QUANTIFICATION
Article Snippet: 33 SI.2 Microfabrication of SU-8 devices for CDSA and SU-8 microchannels for CMM 34 SU-8 passive structures were fabricated using a direct write laser maskless pattern generator 35 (μPG101, Heidelberg Instruments, Heidelberg, Germany).

Article Title: High-Responsivity Planar Photodetector Based on Methylammonium Lead Bromide Perovskite Thin Film
Article Snippet: Interdigitated combs [30] are first patterned using laser lithography (μPG101, Heidelberg Instruments, Yokohama, Japan) with a GDS file on a BK7 substrate.

Article Title: Nb impurity-bound excitons as quantum emitters in monolayer WS 2
Article Snippet: The sample was coated with LOR 3 A resist and baked for 5 min. Then, a second layer of S1805 photoresist was deposited and baked for 1 min. Laser lithography (Heidelberg Instruments μMLA) was used to deposit the electrodes.

Article Title: Gate-Tunable Bound Exciton Manifolds in Monolayer MoSe 2 .
Article Snippet: Two-dimensional (2D) semiconductors with point defects are predicted to host a variety of bound exciton complexes analogous to trions and biexcitons due to strong many-body effects.. However, despite the common observation of defectmediated subgap emission, the existence of such complexes remains elusive.. Here, we report the observation of bound exciton (BX) complex manifolds in monolayer MoSe2 with intentionally created monoselenium vacancies (VSe) using proton beam irradiation.

Bacteria:

Article Title: Single-cell level LasR-mediated quorum sensing response of Pseudomonas aeruginosa to pulses of signal molecules
Article Snippet: Negative master molds were created in a two-layer structure on a silicon wafer coated with SU-8 photoresist (Microchem Corp., Westborough, MA, USA). .. For making the shallow side channels that function as traps for bacteria, an SU8-2002 layer of 0.96 ± 0.22 μm height was spin-coated, and the device's design was written in the resist with a Heidelberg μPG101 micro pattern generator (Heidelberg Instruments GmbH, Heidelberg, Germany). ..



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