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electron backscatter diffraction geminisem300  (Rigaku Corporation)


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    Structured Review

    Rigaku Corporation electron backscatter diffraction geminisem300
    Electron Backscatter Diffraction Geminisem300, supplied by Rigaku Corporation, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/ebsd+electron+backscatter+diffraction+maps/electron+backscatter+diffraction+geminisem300/pm36770146-58-15-12
    Average 90 stars, based on 1 article reviews
    electron backscatter diffraction geminisem300 - by Bioz Stars, 2026-11
    90/100 stars

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    Related Articles

    Electron Microscopy:

    Article Title: Study on Microstructure and Mechanical Properties of TC4/AZ31 Magnesium Matrix Nanocomposites.
    Article Snippet: .. Microstructure Characterization Using scanning electron microscopy (SEM; GeminiSEM300), an X-ray diffractometer (XRD; Rigaku SmartLab), and electron backscatter diffraction (EBSD; GeminiSEM300), we studied the microstructure of as-extruded TC4/AZ31 composites. ..

    Article Title: Phosphorus doping to boost the electro-Fenton degradation of sulfamethoxazole using mixed-valence copper(I and II) phosphate/etched graphite felt cathode
    Article Snippet: Non-metallic atom doping is a good strategy to promote the cathode performance in the electro-Fenton process.. Therefore, a mixed-valence copper (I and II) phosphate (Cu2PO4) catalyst on P-doped etched graphite felt (EGF), with a strip-groove rough surface, was prepared in this study.. The P-doped Cu2PO4/EGF electrode completely removed sulfamethoxazole (SMX) from contaminated water within 90 min over a wide pH range of 5.6–9 and removed 99.6% of SMX at pH 11.

    X-ray Diffraction:

    Article Title: Phosphorus doping to boost the electro-Fenton degradation of sulfamethoxazole using mixed-valence copper(I and II) phosphate/etched graphite felt cathode
    Article Snippet: Non-metallic atom doping is a good strategy to promote the cathode performance in the electro-Fenton process.. Therefore, a mixed-valence copper (I and II) phosphate (Cu2PO4) catalyst on P-doped etched graphite felt (EGF), with a strip-groove rough surface, was prepared in this study.. The P-doped Cu2PO4/EGF electrode completely removed sulfamethoxazole (SMX) from contaminated water within 90 min over a wide pH range of 5.6–9 and removed 99.6% of SMX at pH 11.

    Spectroscopy:

    Article Title: Phosphorus doping to boost the electro-Fenton degradation of sulfamethoxazole using mixed-valence copper(I and II) phosphate/etched graphite felt cathode
    Article Snippet: Non-metallic atom doping is a good strategy to promote the cathode performance in the electro-Fenton process.. Therefore, a mixed-valence copper (I and II) phosphate (Cu2PO4) catalyst on P-doped etched graphite felt (EGF), with a strip-groove rough surface, was prepared in this study.. The P-doped Cu2PO4/EGF electrode completely removed sulfamethoxazole (SMX) from contaminated water within 90 min over a wide pH range of 5.6–9 and removed 99.6% of SMX at pH 11.



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    Fig. 1. (a) Illustration of typical microstructure of as-deposited cold sprayed Cu after [14]. Small grains due to dynamic recrystallization (DRX) are located near the splat-splat interfaces, while towards the interior of the splats subgrains and deformed large grains are present. The local region of EBSD and nanoindentation mapping in the current study is indicated in (b).

    Journal: Materials Science and Engineering: A

    Article Title: Submicrometer Scale Mapping of Microstructure and Mechanical Properties of Cold Sprayed Copper

    doi: 10.1016/j.msea.2024.147556

    Figure Lengend Snippet: Fig. 1. (a) Illustration of typical microstructure of as-deposited cold sprayed Cu after [14]. Small grains due to dynamic recrystallization (DRX) are located near the splat-splat interfaces, while towards the interior of the splats subgrains and deformed large grains are present. The local region of EBSD and nanoindentation mapping in the current study is indicated in (b).

    Article Snippet: Electron backscatter diffraction (EBSD) mapping was performed using a Bruker QUANTAX EBSD system at 15 kV.

    Techniques: Recrystallization

    Fig. 3. SEM/EBSD/nanoindentation results of the as-deposited CS-Cu N2 sample: (a) BSE image, (b) SE image, (c) IPF map, (d) GBCD map with the Brandon criterion, (e) KAM map, (f) GND map overlaying with the grain boundaries (misorientation angle >5◦) in black lines, (g) BSE image after nanoindentation, (h) hardness map.

    Journal: Materials Science and Engineering: A

    Article Title: Submicrometer Scale Mapping of Microstructure and Mechanical Properties of Cold Sprayed Copper

    doi: 10.1016/j.msea.2024.147556

    Figure Lengend Snippet: Fig. 3. SEM/EBSD/nanoindentation results of the as-deposited CS-Cu N2 sample: (a) BSE image, (b) SE image, (c) IPF map, (d) GBCD map with the Brandon criterion, (e) KAM map, (f) GND map overlaying with the grain boundaries (misorientation angle >5◦) in black lines, (g) BSE image after nanoindentation, (h) hardness map.

    Article Snippet: Electron backscatter diffraction (EBSD) mapping was performed using a Bruker QUANTAX EBSD system at 15 kV.

    Techniques:

    Fig. 4. SEM/EBSD/nanoindentation results of the 350 ◦C annealed CS-Cu N2 sample: (a) BSE image, (b) SE image, (c) IPF map, (d) GBCD map with the Brandon criterion, (e) KAM map, (f) GND map overlaying with the grain boundaries (misorientation angle >5◦) in black lines, (g) BSE image after nanoindentation, (h) hardness map.

    Journal: Materials Science and Engineering: A

    Article Title: Submicrometer Scale Mapping of Microstructure and Mechanical Properties of Cold Sprayed Copper

    doi: 10.1016/j.msea.2024.147556

    Figure Lengend Snippet: Fig. 4. SEM/EBSD/nanoindentation results of the 350 ◦C annealed CS-Cu N2 sample: (a) BSE image, (b) SE image, (c) IPF map, (d) GBCD map with the Brandon criterion, (e) KAM map, (f) GND map overlaying with the grain boundaries (misorientation angle >5◦) in black lines, (g) BSE image after nanoindentation, (h) hardness map.

    Article Snippet: Electron backscatter diffraction (EBSD) mapping was performed using a Bruker QUANTAX EBSD system at 15 kV.

    Techniques: