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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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silica nanoparticles  (Beijing Chemical Works)
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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silica nanoparticles aerosil 200  (Evonik)
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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hydrophilic silica nanoparticles  (Wacker Chemie)
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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silica nanoparticles  (Evonik)
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Evonik silica nanoparticles
(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica <t>nanoparticle</t> concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.
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(A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica nanoparticle concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.

Journal: Advanced Science

Article Title: Eco‐Friendly Solvent System for Inkjet Deposition of Wide Bandgap Perovskite Solar Cells Enabling Tandem Integration

doi: 10.1002/advs.76463

Figure Lengend Snippet: (A) Drying patterns (B) Microscopic images close to the edges, and (C) Contact angle of the 1.2 м perovskite ink on the perovskite thin film deposited on the hole transport layer with different silica nanoparticle concentrations and their corresponding contact angles, (D) Wetting envelope (at 0° contact angle plotted by considering polar and dispersive parts of surface free energy) of thin films with various concentrations of SiO 2 ‐NP.

Article Snippet: MABr (99.99% – GreatCell Solar), FAI (99.99% – GreatCellSolar), CsI (99.99% – TCI chemicals), PbBr (99.99% – TCI chemicals), PbI 2 (99.99% – TCI chemicals), 2PACz (Luminescence Technology Corp.), Silica nanoparticles (nanoComposix – 20 nm Aminated), N, N‐dimethylsulfoxide (99% – Sigma–Aldrich), γ‐Valerolactone (Sigma–Aldrich), MACl (99.5% – Luminescence Technology Corp.), PDAI 2 and BAI (GreatCell Solar), Ethanol (>99.8% – VWR Chemical), Isopropanol (>99.8% – VWR Chemical), C 60 (Sigma–Aldrich), BCP (Lumtec), Methanol (>99.9% – VWR Chemical), (4‐(3,6‐diphenyl 9H‐carbazol‐9‐yl)butyl)phosphonic acid (Suzhou LiWei Tech Co., Ltd).

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