photomosaicing applications Search Results


glass-chrome ronchi rule photomask  (Applied Image Inc)
90
Applied Image Inc glass-chrome ronchi rule photomask
Glass Chrome Ronchi Rule Photomask, supplied by Applied Image Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomosaicing+applications/glass+chrome+ronchi+rule+photomask/pm24911660-52-59-63
Average 90 stars, based on 1 article reviews
glass-chrome ronchi rule photomask - by Bioz Stars, 2026-10
90/100 stars
  Buy from Supplier
glass-chrome custom photomask  (Applied Image Inc)
90
Applied Image Inc glass-chrome custom photomask
Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the <t>photomask</t> (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Glass Chrome Custom Photomask, supplied by Applied Image Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomosaicing+applications/glass+chrome+custom+photomask/pmc10993768-53-20-23
Average 90 stars, based on 1 article reviews
glass-chrome custom photomask - by Bioz Stars, 2026-10
90/100 stars
  Buy from Supplier
photomask 1.52-mm-thick sodalime glass  (Applied Image Inc)
90
Applied Image Inc photomask 1.52-mm-thick sodalime glass
Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the <t>photomask</t> (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Photomask 1.52 Mm Thick Sodalime Glass, supplied by Applied Image Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomosaicing+applications/photomask+1+52+mm+thick+sodalime+glass/pm37075323-57-1-5
Average 90 stars, based on 1 article reviews
photomask 1.52-mm-thick sodalime glass - by Bioz Stars, 2026-10
90/100 stars
  Buy from Supplier
mask rayzist sr3000 photoresist film  (Rayzist Photomask)
90
Rayzist Photomask mask rayzist sr3000 photoresist film
Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the <t>photomask</t> (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Mask Rayzist Sr3000 Photoresist Film, supplied by Rayzist Photomask, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomosaicing+applications/sr3000+photoresist+mask/10__1016_slash_j__compositesa__2024__108661-132-6-8
Average 90 stars, based on 1 article reviews
mask rayzist sr3000 photoresist film - by Bioz Stars, 2026-10
90/100 stars
  Buy from Supplier
distinct chrome coated photomasks  (Autodesk Inc)
86
Autodesk Inc distinct chrome coated photomasks
Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the <t>photomask</t> (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Distinct Chrome Coated Photomasks, supplied by Autodesk Inc, used in various techniques. Bioz Stars score: 86/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomosaicing+applications/chrome+coated+distinct+photomasks/10__1002_slash_adtp__201900130-249-1-10
Average 86 stars, based on 1 article reviews
distinct chrome coated photomasks - by Bioz Stars, 2026-10
86/100 stars
  Buy from Supplier

Image Search Results


Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the photomask (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.

Journal: Journal of Neural Engineering

Article Title: The geometry of photopolymerized topography influences neurite pathfinding by directing growth cone morphology and migration

doi: 10.1088/1741-2552/ad38dc

Figure Lengend Snippet: Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the photomask (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.

Article Snippet: Then, to create the patterned substrates, this solution was evenly dispersed on a silane-coupled piece of cover glass by placing glass-chrome custom photomask (Applied Image Inc., figure (b)) on top.

Techniques: Confocal Microscopy