photomask Search Results


90
Carl Zeiss photomask repair tool merits
Photomask Repair Tool Merits, supplied by Carl Zeiss, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pm35395668-68-7-6?v=Carl+Zeiss
Average 90 stars, based on 1 article reviews
photomask repair tool merits - by Bioz Stars, 2026-08
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90
Imagesetter Inc photomask transparency films
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Photomask Transparency Films, supplied by Imagesetter Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pmc02910130-92-19-22?v=Imagesetter+Inc
Average 90 stars, based on 1 article reviews
photomask transparency films - by Bioz Stars, 2026-08
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90
Infinite Graphics Inc chrome-on-glass photomask for the microsphere array pattern
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Chrome On Glass Photomask For The Microsphere Array Pattern, supplied by Infinite Graphics Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pmc03996899-80-1-17?v=Infinite+Graphics+Inc
Average 90 stars, based on 1 article reviews
chrome-on-glass photomask for the microsphere array pattern - by Bioz Stars, 2026-08
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90
Verlag GmbH photomask
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Photomask, supplied by Verlag GmbH, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/10__1002_slash_adfm__201700127-166-17-9?v=Verlag+GmbH
Average 90 stars, based on 1 article reviews
photomask - by Bioz Stars, 2026-08
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90
MicroChem corp photomask
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Photomask, supplied by MicroChem corp, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pm33691119-244-1-11?v=MicroChem+corp
Average 90 stars, based on 1 article reviews
photomask - by Bioz Stars, 2026-08
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90
Microtronics Inc chrome-plated quartz photomask
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Chrome Plated Quartz Photomask, supplied by Microtronics Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pmc04142236-32-2-4?v=Microtronics+Inc
Average 90 stars, based on 1 article reviews
chrome-plated quartz photomask - by Bioz Stars, 2026-08
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90
Silverline Tools photomask transparency films
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Photomask Transparency Films, supplied by Silverline Tools, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/us07935364-236-17-20?v=Silverline+Tools
Average 90 stars, based on 1 article reviews
photomask transparency films - by Bioz Stars, 2026-08
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90
Rayzist Photomask lasermask sand carving film
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Lasermask Sand Carving Film, supplied by Rayzist Photomask, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pmc04329291-138-0-4?v=Rayzist+Photomask
Average 90 stars, based on 1 article reviews
lasermask sand carving film - by Bioz Stars, 2026-08
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90
Optics and Photonics photomask
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Photomask, supplied by Optics and Photonics, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/10__3390_slash_jlpea11010002-1625-1-7?v=Optics+and+Photonics
Average 90 stars, based on 1 article reviews
photomask - by Bioz Stars, 2026-08
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90
Applied Image Inc glass-chrome ronchi rule photomask
Characteristics of the gradient pattern used in photo-immobilization of EGF gradients
Glass Chrome Ronchi Rule Photomask, supplied by Applied Image Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pm24911660-52-59-63?v=Applied+Image+Inc
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Applied Image Inc glass-chrome custom photomask
Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the <t>photomask</t> (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Glass Chrome Custom Photomask, supplied by Applied Image Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pmc10993768-53-20-23?v=Applied+Image+Inc
Average 90 stars, based on 1 article reviews
glass-chrome custom photomask - by Bioz Stars, 2026-08
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90
Artnet Pro Inc mylar mask artnet pro
Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the <t>photomask</t> (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Mylar Mask Artnet Pro, supplied by Artnet Pro Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/photomask/pm37974303-70-19-22?v=Artnet+Pro+Inc
Average 90 stars, based on 1 article reviews
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Image Search Results


Characteristics of the gradient pattern used in photo-immobilization of EGF gradients

Journal:

Article Title: Regulation of Keratinocyte Signaling and Function via Changes in Epidermal Growth Factor Presentation

doi: 10.1016/j.actbio.2010.04.006

Figure Lengend Snippet: Characteristics of the gradient pattern used in photo-immobilization of EGF gradients

Article Snippet: Several 1 cm diameter radial gradient images were created in Adobe Illustrator 10, and were then used to print photomask transparency films (Imagesetter, Madison, WI).

Techniques:

Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the photomask (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.

Journal: Journal of Neural Engineering

Article Title: The geometry of photopolymerized topography influences neurite pathfinding by directing growth cone morphology and migration

doi: 10.1088/1741-2552/ad38dc

Figure Lengend Snippet: Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the photomask (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.

Article Snippet: Then, to create the patterned substrates, this solution was evenly dispersed on a silane-coupled piece of cover glass by placing glass-chrome custom photomask (Applied Image Inc., figure (b)) on top.

Techniques: Confocal Microscopy